본문
위・아래
삭제
복제
복제전송
텍스트기본스타일
PECVD
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PECVD
위・아래
삭제
복제
복제전송
텍스트기본스타일
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Type | Products |
Cluster | Cluster System for PECVD Silicon Layer(Cluster CVD-300) |
PECVD-PVD Cluster System for Graphene Synthesis (Graphene Cluster Lab 200) | |
Batch | ICP CVD System for Graphene and Boron Carbide Layers(PECVD Lab 200-(Ref1) |
PECVD System for Diamondlike Carbon(DLC PECVD Lab-100D) | |
PECVD System for OLED Barrier Layers(EL-PECVD Lab-100) | |
PECVD System with High Density Plasma(PECVD Lab-100O) | |
PECVD System for Low Temp. CNTs Synthesis(PECVD Lab-100-N) (ref1), (ref2), (ref3) (ref4), (ref5) | |
PECVD System for Solar Cell AR Coatings(PECVD Lab-300) | |
Large scale of plasma surface Modification and PECVD system (PECVD-B2600) | |
Thermal CVD system for nanowire synthesis(PECVD Nano Lab-100)-(Ref1) | |
PEALD System for R&D applications(PEALD-150S1) | |
PECVD System including LPCVD Function for Large Area Deposition(CVD-1000S) |
